Chabal, Fundamental aspects of silicon oxidation.
Chabal, Fundamental aspects of silicon oxidation.
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Chabal, Yves J. (Ed.) Fundamental aspects of silicon oxidation. Berlin/Heidelberg/New York/Barcelona/Hong Kong/London/Milan/Paris/Singapore/Tokyo, Springer, 2001. 24 cm. 147 figs., 21 in color, XIII, 260 p. Hardcover Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Springer series in materials science ; 46 Physics and astronomy online library
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